Method and System for Overlay Control

ABSTRACT

A method for overlay monitoring and control is introduced in the present disclosure. The method comprises forming resist patterns on one or more wafers in a lot by an exposing tool; selecting a group of patterned wafers in the lot using a wafer selection model; selecting a group of fields for each of the selected group of patterned wafers using a field selection model; selecting at least one point in each of the selected group of fields using a point selection model; measuring overlay errors of the selected at least one point on a selected wafer; forming an overlay correction map using the measured overlay errors on the selected wafer; and generating a combined overlay correction map using the overlay correction map of each selected wafer in the lot.

BACKGROUND

The semiconductor integrated circuit (IC) industry has experiencedexponential growth. Technological advances in IC materials and designhave produced generations of ICs where each generation has smaller andmore complex circuits than the previous generation. In the course of ICevolution, functional density (i.e., the number of interconnecteddevices per chip area) has generally increased while geometry size(i.e., the smallest component (or line) that can be created using afabrication process) has decreased. This scaling down process is theresult of various process changes and improvements, including moreprecise lithography. Such scaling down has also increased the complexityof processing and manufacturing ICs and, for these advances to berealized, similar developments in IC processing and manufacturing areneeded.

With small feature sizes in advanced technology nodes, lithographypatterning faces more challenges. For example, overlay error needs to bemuch smaller since feature size is reduced. On the other hand,lithography technology uses a radiation beam of high energy photons,such as deep ultraviolet (DUV) or extreme ultraviolet (EUV), since highenergy photons have short wavelength and high resolution that enableformation of small size features.

The method for overlay control and monitoring usually includes selectinglimited number of sample wafers by an experienced user and measuringonly the selected sample wafers. The sampling locations and quantitieson each selected wafers are also decided by the user. For example, 17dies out of 62 dies on a wafer, and 12 points out of each selected dieare decided by the user's experience for performing the overlay errormeasurement. This method relies on human experience, thus sometimesresults in poor measurement coverage, such as full measurement in somefields and no measurement in other fields. This method may alsointroduce redundant measurements in some regions of the wafer whichresult in inefficient and ineffective processes and low throughput.Therefore there is a need for an optimized sampling strategy for overlaycontrol and monitoring.

BRIEF DESCRIPTION OF THE DRAWINGS

The present disclosure is best understood from the following detaileddescription when read with accompanying figures. It is emphasized that,in accordance with the standard practice in the industry, variousfeatures are not drawn to scale and are used for illustration purposeonly. In fact, the dimension of the various features may be arbitrarilyincreased or reduced for clarity of discussion.

FIG. 1A is a block diagram of a system for overlay control andmonitoring constructed according to various embodiments of the presentdisclosure.

FIG. 1B is a schematic diagram of an exposing tool constructed accordingto various embodiments of the present disclosure.

FIG. 2A is a flowchart of a method for overlay control and monitoringusing the system of FIG. 1A according to various embodiments of thepresent disclosure.

FIG. 2B is a flowchart illustrating an example of field selection modelaccording to some embodiments of the present disclosure.

FIGS. 3A-3B illustrate a method of dividing the fields of a waferaccording to various embodiments of the present disclosure.

FIGS. 4A-4F illustrate a method of dividing the fields of a waferaccording to various embodiments of the present disclosure.

FIG. 5A illustrates a combined intra-field overlay map of pointselection processes performed in the same field on a plurality of wafersaccording to some embodiments of the present disclosure.

FIG. 5B is an exemplary method of point selection process performed inthe center field according to some embodiments of the presentdisclosure.

FIG. 5C is an overlay correction map formed using the overlay errorsmeasured on a wafer according to some embodiments of the presentdisclosure.

FIG. 6A is an exemplary combined overlay correction map after combiningoverlay correction maps of a plurality of selected wafers in a lotaccording to some embodiments of the present disclosure.

FIG. 6B illustrates the comparison results of the overlay errorsmeasured using (1) a full measurement method, (2) an overlay measurementmethod decided by the user's experience, and (3) the combined overlaycorrection map according to some embodiments of the present disclosure.

FIG. 7A is a flowchart illustrating a method for forming a combinedoverlay correction map for wafers from a plurality of lots according tovarious embodiments of the present disclosure.

FIG. 7B is a flowchart illustrating an example of field selection modelaccording to some embodiments of the present disclosure.

FIG. 7C illustrates a combined intra-field overlay map of pointselection processes performed on wafers from a plurality of lotsaccording to some embodiments of the present disclosure.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the disclosure.Specific examples of components and arrangements are described below tosimplify the present disclosure. These are, of course, merely examplesand are not intended to be limiting. For example, the formation of afirst feature over or on a second feature in the description thatfollows may include embodiments in which the first and second featuresare formed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.

FIG. 1A is a block diagram illustrating a system 100 for implementing amethod for overlay control and monitoring according to various aspectsof the present disclosure. It is understood that other configurationsand inclusion or omission of various items in the system 100 may bepossible. The system 100 is exemplary, and is not intended to limit thedisclosure beyond what is explicitly recited in the claims. As shown inFIG. 1A, the system 100 includes a computer 102, an exposing tool 106,and an overlay metrology tool 108.

Referring to FIG. 1A, the system 100 includes a computer 102. In someembodiments, the computer 102 may generate one or more selection modelsfor selecting points, fields, and/or wafers in one or more lots foroverlay errors measurement and control. The computer 102 may alsoperform statistical analysis of the collected overlay error data, forexample, the computer 102 may weight the points, fields, and/or wafersbased their possibility of being chosen using the overlay error datafrom the previous measurements. The computer 102 may generate a combinedoverlay correction map based on the overlay error data measured from aplurality of wafers in one lot, or in a plurality of lots on arun-to-run basis. In some embodiments, the computer 102 is a standard,general-purpose computer, including a processor, memory, and aninterface. The computer 102 may be a single computer or a distributedcomputer, and connects to various components of the exposing tool 106and overlay metrology tool 108, including but not limited to theconnections shown in FIG. 1A. In some embodiments, the computer 102includes one or more software programs for calculating and predictingoverlay data.

In an alternative embodiment, the system 100 may also include anintegrated circuit (IC) design database 104 coupled to the computer 102.The IC design database 104 is designed to store and manage IC designlayout data. In some embodiments, the IC design database 104 includes aplurality of IC design layouts which will be transferred onto asemiconductor wafer to form various circuit components. The circuitcomponents may include a transistor, a capacitor, a resistor, and/or ametal line connecting the IC devices. An IC design layout includes an ICpattern having a plurality of IC features. The IC pattern is formed on amask. In a lithography process, the IC pattern (with the IC features) istransferred to a resist layer coated on the wafer using the mask and theexposing tool 106. In some embodiments, the design database may beintegrated in the computer 102.

In some embodiments, the computer 102 calculates and predicts one ormore process parameters for evaluating the exposure process. The processparameters may be determined using information from the design database104 and the exposing tool 106. The process parameters may be used todetermine the number and positions of the overlay marks that arepatterned on the mask and then transferred onto the resist pattern ofthe IC design on the wafer during exposure. The overlay errors may becalculated by comparing the positions of the predetermined overlay marksand the corresponding marks on the resist pattern formed duringexposure. The overlay errors of different wafers from one or more lotsmay be combined to form an overlay correction map. The combined overlaycorrection map may demonstrate a model including compensation valuesthat are needed to adjust the exposure tool 106 so that the overlayerror may be reduced in the future exposure process. For example, themodel may be a linear model showing a linear increasing or decreasingtrend along a certain direction. The exposure tool 106 may be adjustedto compensate for the previously discovered trend.

The exposing tool 106 of FIG. 1A is further described in detail withreference to FIG. 1B in a schematic view. The exposing tool 106 isoperable to expose a resist layer coated on a wafer 164. In someembodiments, the exposing tool 106 includes a radiation source(illumination source) 152 to generate radiation energy (or radiationbeam) to expose the resist layer. The radiation energy includesultraviolet (UV) light, deep ultraviolet (DUV) light, extremeultraviolet (EUV) light, electron-beam in various examples.

The exposing tool 106 may also include an illumination module withvarious optical components configured to image a mask 158 onto a wafer164. The illumination module may include multiple lenses and/or otheroptical components. In some embodiments as shown in FIG. 1B, theillumination module includes a lens 154 and a projection lens 160.

The exposing tool 106 may also include a mask stage 156 designed tosecure a mask (also referred to as reticle or photo mask) 158 andconfigured between the lens 154 and a projection lens 160. The mask 158has a pattern to be transferred to the semiconductor wafer 164. Thepattern of the mask 158 may include a plurality of predetermined overlaymarks used in the following overlay control and monitoring process. Insome embodiments, the mask 158 includes a substrate and a patternedlayer formed on the substrate. In some embodiments, the mask 158includes a transparent substrate and a patterned absorption layer. Thetransparent substrate may use fused silica (SiO₂) relatively free ofdefects, such as borosilicate glass and soda-lime glass. The transparentsubstrate may use calcium fluoride and/or other suitable materials. Thepatterned absorption layer may be formed using a plurality of processesand a plurality of materials, such as depositing a metal film made withchromium (Cr), or other suitable material, such as MoSi. A light beammay be partially or completely blocked when directed on an absorptionregion. The absorption layer may be patterned to have one or moreopenings through which a light beam may travel without being absorbed bythe absorption layer. The mask may incorporate other resolutionenhancement techniques such as phase shift mask (PSM) and/or opticalproximity correction (OPC).

In some embodiments, the mask 158 is a reflective mask used in an EUVlithography system. The reflective mask includes a substrate of a lowthermal expansion material (LTEM), and a reflective multilayer filmformed on the substrate. The reflective mask further includes anabsorption layer patterned to form a main pattern according to an ICdesign layout.

The exposing tool 106 also includes a wafer stage 162 designed to securea wafer 164 and is operable to move transitionally and/or rotationally.The wafer 164 may be a semiconductor wafer, such as a silicon wafer, orother suitable wafer to be patterned.

Still referring to FIG. 1A, the system 100 includes an overlay metrologytool 108 coupled with the exposing tool 106 and the computer 102. Theoverlay metrology tool 108 is designed to measure overlay error databetween the predetermined positions of the overlay marks and thepositions of the marks transferred onto the resist pattern on the waferduring the exposure process. The overlay metrology tool 108 receives thewafer with the resist pattern, performs an overlay measurement of theresist pattern to obtain the overlay error data of the resist pattern,and may send the overlay error data to the computer 102 for furtherprocessing.

The overlay error data of a plurality of wafers may be used forgenerating a combined overlay correction map to evaluate and adjust theexposure condition of the exposure tool 106 when necessary. The system100 is described according to various embodiments. However, in variousembodiments, the various modules of the system 100 may be integratedtogether. For example, although FIG. 1 illustrates an overlay metrologytool 108 separate from the exposing tool 106, the overlay metrology tool108 may be integrated into the exposing tool 106 in any suitableconfiguration. In some embodiments, the various modules of the system100 may be distributed in different locations and coupled togetherthrough intranet or the internet. In some embodiments, various functionsmay be built in different modules. For example, the one or moreselection models may be generated by the computer 102 or the overlaymetrology tool 108.

FIG. 2A is a flowchart of a method 200 for forming a combined overlaycorrection map for overlay control and monitoring according to variousembodiments of the present disclosure. In some embodiments, the method200 is implemented using the system 100 as shown in FIGS. 1A-1B. It isunderstood that additional steps can be provided before, during, andafter the method 200, and some steps described can be replaced,eliminated, or moved around for additional embodiments of the method200. The method 200 is an example, and is not intended to limit thedisclosure beyond what is explicitly recited in the claims.

The method 200 begins at operation 202 by forming resist patterns on oneor more wafers 164 in a lot using the exposing tool 106. In someembodiments, the wafers 164 include a silicon wafer. Alternatively oradditionally, the wafers 164 include another elementary semiconductor,such as germanium; a compound semiconductor including silicon carbide,gallium arsenic, gallium phosphide, indium phosphide, indium arsenide,and/or indium antimonide; or an alloy semiconductor including SiGe,GaAsP, AlInAs, AlGaAs, GaInAs, GaInP, and/or GaInAsP. In variousembodiments, the wafers 164 may include a plurality of circuit features,such as an isolation feature, a doped well, a source/drain, a gate, avia feature or a metal line.

Still referring to operation 202, the resist patterns may be formed onthe wafers 164 using a lithography process. In some embodiments, thelithography process may include forming a resist layer overlaying thewafer 164, exposing the resist layer to a pattern on the mask,performing a post-exposure bake process, and developing the resist layerto form a masking element including the resist layer on the wafer. Insome embodiments, the mask includes a plurality of predetermined overlaymarks. Therefore, the resist patterns formed on the wafer may alsoinclude a plurality of marks corresponding to the overlay marks formedduring the exposure process.

At operation 204 of method 200, a group of pattered wafers from a lotare selected for overlay error measurement. The wafer selection processmay be performed by the overlay metrology tool 108, using a waferselection model generated by the computer 102. In general, there are aplurality of wafers in one lot, for example, 25 wafers in one lot. Thewafers within a lot may be selected randomly to be measured. The numberof wafers to be chosen in a lot may be predetermined depending on theamount of data needed to generate the overlay correction map withoptimized coverage to better evaluate the process parameters. Meanwhile,the number of wafers is also chosen in consideration of the amount oftime needed for the overlay measurement in a lot. In some examples, 6-12pieces of wafers in a lot may be selected for overlay error measurement.

In some examples, the wafer selection model includes selecting a groupof wafers with each wafer positioned at a constant interval from eachother within a lot. For example, the group of wafers may include waferspositioned at odd number sequence (e.g., 1^(st), 3^(rd), 5^(th), . . .), or even number sequence (e.g., 2^(nd), 4^(th), 6^(th), . . . ) withina lot.

The wafer selection model, in some embodiments, includes weighting thepossibilities of each wafer location (e.g., sequence 1^(st), 2^(nd),3^(rd)) within a lot of being chosen based on the data from the previousoverlay measurements. The wafer selection model then selects thepatterned wafers in the locations with less possibilities of beingchosen previously. For example, the wafer locations within a lot may beweighted by using a weighting factor x_(ij) to indicate the possibilityof the wafer at the corresponding location being chosen based on theprevious selections and measurements data, wherein x_(ij) indicates theweighting factor of a patterned wafer at wafer location i being chosenfor j times in the previous overlay measurements. Each wafer location isassigned with an initial weighting factor x_(i0)=100%, indicating apatterned wafer at wafer location i being chosen for zero times in theprevious overlay measurements. After a patterned wafer at wafer locationi is selected once in the history, the weighting factor x_(ij) ismultiplied by a predetermined factor, such as a=0.5. Then the currentweighting factor of a patterned wafer at wafer location i becomesx_(i1)=x_(i0)·a=50%, indicating a decreased possibility, e.g., from 100%to 50%, of being chosen for future overlay error measurements.Accordingly the weighting factor x_(ij) may change based on the times ofbeing selected and measured in the previous overlay measurements. Theweighting factor x_(ij) of the patterned wafer may be then used in thewafer selection models to select one or more patterned wafers within alot in the current wafer selection process. For example, the patternedwafer with the largest weighting factor x_(ij) may have the leastpossibility of being chosen in the previous overlay error measurements,and thus may be most likely to be selected for the current overlay errormeasurement. The above mentioned embodiments are merely exemplary, andare not intended to limit the disclosure beyond what are explicitlylisted.

The method 200 proceeds to operation 206 by selecting a group of fieldson each selected patterned wafer for overlay error measurement by theoverlay metrology tool 108, based on a field selection model generatedby the computer 102. In some embodiments, a wafer may be divided into aplurality of fields for overlay error measurement as shown in FIGS.3A-3B and 4A-4F. The fields on a wafer may be dies on the wafer. FIG. 2Bis a flowchart showing an example of field selection model 260 performedat operation 206.

Referring to FIGS. 3A-3B, in some examples, the fields on a wafer may beseparated into a first group (as shown in FIG. 3A) and a second group(as shown in FIG. 3B). One example of separating the first group fromthe second group of fields may be described as follows. A twodimensional frame may be used as a coordination system to label theposition of each field on a wafer. The origin of the two dimensionalframe may be put in a predetermined field in the middle region of thewafer, as shown in FIGS. 3A-3B. In one example, the field (0, 0) may beincluded in the first group. The fields to the next right, next left,next up and next down of the field (0, 0) are also included in the firstgroup. The rest of the fields in the first group may be selected in thesimilar method where no two immediately adjacent fields are included inthe first group. The fields to the immediate right, immediate left,immediate up and immediate down of the (0, 0) field are included in thesecond group. The rest of the fields in the second group may be selectedin the similar method where no two immediately adjacent fields areincluded in the second group. In some embodiments, the first group offields is a complement set of the second group of fields, where there iscommon field owned by both first and second groups, and the sum of thefirst and second groups of fields can cover the entire fields on awafer.

Referring to FIGS. 4A-4F, in some embodiments, the fields may beseparated using an alternative method. For example, the fields disposedat the edges of the wafer are defined as edge fields (EF) as shown inFIG. 4A. The field disposed at the origin (0, 0) of the two dimensionalframe is defined as a center field (CF) as shown in FIG. 4B. The rest ofthe fields on the wafer can be separated into first and second types offields using similar method as described with respect to FIGS. 3A-3B.For example, the origin field (center field) is included in the firsttype of fields, and the fields that are disposed to the next right, nextleft, next up and next down are also included in the first type offields. The first type of fields also includes fields that are disposednot immediately next to each other as shown in FIG. 4C. The fields tothe immediate right, immediate left, immediate up and immediate down ofthe (0, 0) field are included in the second type of fields. The secondtype of fields may be selected in the similar method where no twoimmediately adjacent fields are included in the second type of fields,as shown in FIG. 4D. All of the fields on a wafer may be then separatedinto first and second groups as shown in FIGS. 4E-4F. The first group offields includes edge fields, center field, and the first type of fieldsas shown in FIG. 4E. The second group of fields includes edge fields,center field, and the second type of fields as shown in FIG. 4F.

At operation 206 for overlay error measurement, the field selectionprocess may be performed by the overlay metrology tool 108. After allthe fields have been separated into the first and second groups as shownin step 262 of FIG. 2B, the field selection model 260 of operation 206may proceed to step 263 by separating the selected group of patternedwafers in the lot from operation 204 into first and second sub-groups ofwafers. In some embodiments, the first and second sub-groups of wafersare randomly divided to have the same or not the same number of wafers.In some embodiments, the first and second sub-group may be assigned tothe selected patterned wafers in an alternating sequence. The fieldselection model 260 then proceeds to selecting the first group of fieldsfor the first sub-group of wafers to be tested (step 264 of method 260),and selecting the second group of fields for the second sub-group ofwafers to be tested (step 266 of method 260). Although the fields on awafer are only described to be separated into two groups in the currentdisclosure, the fields may be divided into any suitable number of groupsin any suitable topology, for example n groups. The selected patternedwafers may be also divided into m sub-groups, where each of the n groupsof fields is assigned to each of the m sub-groups of wafers to betested. The number of the sub-groups m may or may not equal to thenumber n of categories of the fields.

Still referring to operation 206, the field selection model may alsoinclude some alternative methods. In some embodiments, the fieldposition on a wafer may be weighted using a weighting factor to indicatethe possibility of the field at the corresponding location being chosenbased on the previous selections and measurements data. The field with aless possibility of being chosen in the previous measurement may have ahigher possibility of being selected for the current overlay errormeasurement. The detailed weighting and selecting process may be similarto the examples of wafer selection models as discussed with respect tooperation 204 of method 200. The above mentioned embodiments areexemplary, and are not intended to limit the disclosure beyond what areexplicitly listed.

Referring to FIG. 2A, method 200 proceeds to operation 208 by selectingan un-measured wafer of the selected group of patterned wafers.

Referring to FIGS. 2A and 5A, method 200 proceeds to operation 210 byselecting at least one point (e.g., point 504, 507, 505 or 508) amongthe marks (e.g., 502) transferred from overlay marks in a field (e.g.,field 506) selected from operation 206 to measure overlay errors by theoverlay metrology tool 108. At least one point is selected for eachfield of the group of fields selected at operation 206. The marks 502may be determined using the process parameters, and then patterned onthe mask 158. Marks 502 corresponding to the overlay marks on the mask158 are then formed on the resist pattern on the wafer 164 using themask 158 during exposure. The point selection process may be performedbased on a point selection model generated by the computer 102.

In some embodiments, the point selection model includes randomlyselecting a first group of points (e.g., points 504 and 507) among themarks transferred from the overlay marks (e.g., overlay mark 502) in afield 506, wherein the field 506 is selected from operation 206 on awafer out of the first sub-group of wafers. A second group of points(e.g., points 505 and 508) are then selected among the marks transferredfrom the overlay marks (e.g., overlay mark 502) in the field 506 on adifferent wafer out of the first sub-group of wafers. In someembodiments, the first group of points is different from the secondgroup of points. In some embodiments, the first group of points is thesame as the second group of points. The number of wafers in eachsub-group and/or the number of points selected in each field arepredetermined to have an optimized relationship between the number ofmarks being tested and the time needed for scanning among all selectedwafers. Referring to FIGS. 5A-5B, in some embodiments, there are twopoints being selected each time in a field. In some alternativeembodiments, one point or more than two points may be selected in afield to determine the overlay errors.

In some alternative embodiments, all the marks transferred from theoverlay marks (e.g., overlay mark 502) onto the resist pattern within afield (e.g., field 506) may be weighted by their possibility of beingchosen based on the previous selections and measurements data. Then oneor more points with less possibilities of being chosen in the previousmeasurements are selected for the current overlay error measurement. Thedetailed weighting and selecting process may be similar to the examplesof wafer selection models as discussed with respect to operation 204 ofmethod 200. The above mentioned embodiments are exemplary, and are notintended to limit the disclosure beyond what are explicitly listed.

During the exposure process, center field may have greater overlay shiftdue to the lens heating and reticle heating. Therefore, during overlaymeasurement, center field (0, 0) may have a different point selectionmethod from the rest of the fields on a wafer. In some examples, asshown in FIG. 5B, eight fixed points (e.g., point 512) may be selectedto calculate the overlay errors for center field (0, 0) 510. A closestpoint (e.g., point 514) to a fixed point (e.g., point 512) may beselected to calculate the overlay errors.

Referring to FIGS. 2 and 5C, method 200 proceeds to operation 212 bymeasuring the overlay error of the selected points on the current waferat operation 210. The overlay errors may be determined by checking ifthe positions of the selected points on the resist pattern match withthe positions of the corresponding overlay marks transferred onto theresist pattern. When there is a position difference between the selectedpoints and the corresponding overlay marks, the overlay errors may berepresented using the vectors (e.g., vector 522 in FIG. 5C) illustratingthe position difference and direction difference between the selectedpoints and the corresponding overlay marks. The different grey levels ofcolors of the arrow vectors show in FIG. 5C reflect the magnitude of thevalues of overlay errors as shown in the scale 521.

Method 200 proceeds to operation 214 by forming an overlay correctionmap (e.g., 523 of FIG. 5C) of the measured overlay errors on the currentwafer from operation 212. FIG. 5C shows an overlay correction map 523formed using the overlay errors measured on a wafer 520. The overlayerror correction map may be constructed by the overlay error vectors,such as overlay error vectors 522 and 526. The overlay error vectors maybe formed by comparing, on a point-to-point basis, the measuredpositions of the selected points and the positions of the correspondingoverlay marks. In some examples, the field coverage rate by the selectedpoints using the point selection model and field selection model of thepresent disclosure may be around 30% on a wafer (e.g., wafer 520).

Method proceeds to operation 216 by storing the overlay correction mapof the current wafer in a computer readable media on the computer 102.Some common forms of computer readable media includes, for example,floppy disk, flexible disk, hard disk, magnetic tape, any other magneticmedium, CD-ROM, any other optical medium, punch cards, paper tape, anyother physical medium with patterns of holes, RAM, PROM, EPROM,FLASH-EPROM, any other memory chip or cartridge, carrier wave, or anyother medium from which a computer is adapted to read.

Method 200 proceeds to operation 218 to decide if all wafers selectedfrom operation 204 have been measured. When not all selected wafers havebeen measured, method 200 proceeds to operation 208 by selecting thenext un-measured wafer from the selected group of patterned wafers.Operation 208 then proceeds to operations 210-216 to measure the overlayerrors of the next wafer and form an overlay correction map of the nextwafer. The formed overlay correction map is stored in the computerreadable media.

FIG. 5A shows a combined intra-field overlay map 500 illustrating thepoint selection processes performed in the same field 506 on differentwafers. A plurality of marks (e.g., mark 502) are patterned in field 506on a plurality of different wafers. The point selection processes mayselect different points, for example points 504 and 507 in field 506 ona first wafer, and points 505 and 508 on a second wafer, using the pointselection model for overlay error measurement. A plurality of waferswith selected points in field 506 are combined to form a combinedintra-field overlay map 500 corresponding to the overlay errordistribution in field 506. As shown in FIG. 5A, although only a certainnumber of points in field 506 on each wafer are selected for overlayerror measurement, after combining the overlay error data from aplurality of wafers, the measured points in field 506 may have a goodcoverage of all the marks. For example the field coverage rate by themeasured points using the point selection model and field selectionmodel of the present disclosure may be around 50% for all the selectedwafers in a lot.

When all selected wafers have been measured, method 200 proceeds tooperation 220 by generating a combined overlay correction map 600 asshown in FIG. 6A using the overlay correction maps of all the selectedwafers in a lot. The combined overlay correction map may be used foroverlay control and monitoring. For example, the combined overlaycorrection map may reflect a linear model of the error distribution,e.g. overlay shift along a certain direction, on the measured wafers.The linear model may be used to make adjustment to the exposing tool106, so that the overlay error may be reduced in the future exposures.For example, if there is a linear increase of the overlay errors along acertain direction, compensation may be made to adjust the mismatchingand/or misalignment problems raised between mask and wafer in theexposing tool 106. The subsequent wafers may be performed with alithography process at operation 202 after the adjustment made to theexposing tool 106. The overlay errors of the subsequent wafers may bethen monitored by operations 204-220 as discussed above.

FIG. 6A is an exemplary combined overlay correction map 600 aftercombining overlay correction maps of a plurality of selected wafers inone lot. A group of wafers are selected using the wafer selection modelat operation 204, and a group of fields are selected using the fieldselection model at operation 206. For example, wafer #7 and wafer #25are selected from a lot, and the first group of fields is selected foroverlay error measurement. Wafer #13 and wafer #19 are selected from thesame lot, and the second group of fields is selected for overlay errormeasurement. At least one point is selected from each selected field oneach selected wafer using the point selection model at operation 210 ofmethod 200. The overlay correction map 612 of wafer #7, overlaycorrection map 614 of wafer #25, overlay correction map 622 of wafer#13, and overlay correction map 624 of wafer #19 are formed and combinedto generate the combined overlay correction map 600 as shown in FIG. 6A.

FIG. 6B illustrates the comparison results of the overlay errorsmeasured using (1) a full measurement method, (2) an overlay measurementmethod decided by the user's experience, and (3) the combined overlaycorrection map (e.g., 600 of FIG. 6A) using method 200 of FIG. 2A. Themethod 1 (full measurement) may include selecting 5 pieces of wafers outof one lot, selecting all 62 fields on each wafer, and selecting 2random points in each field to perform the overlay measurement. Themethod 2 (overlay measurement decided by the user's experience) mayinclude selecting 3 pieces of wafers out of one lot, selecting 17 fieldsout of 62 fields on each selected wafer, and selecting fixate 12 pointsin each selected field to perform the overlay measurement. The waferselection, filed selection and point selection are all deiced by theuser. The method 3 (overlay errors measured using the combined overlaycorrection map) may include selecting 7 wafers out of one lot using thewafer selection model disclosed at operation 204 of method 200,selecting first and second groups of fields using the field selectionmodel disclosed at operation 206 of method 200, and selecting 8 fixatepoints in the center field, and selecting 2 points in the rest of thefields using the point selection model disclosed at operation 210 ofmethod 200. The distance along x and y directions of each vector of theoverlay errors measured in the above three measurement methods arerespectively calculated. Geometric mean values of the overlay errorsalong x and y directions are then calculated, and the difference aftercomparing mean values of method 1 and 2, and method 1 and 3 are shown inFIG. 6B. As shown in FIG. 6B, the difference of the overlay errors meanvalues between method 3 and method 1 is less than the difference of theoverlay errors mean values between method 2 and method 1. Therefore,method 3 is a more accurate and effective method for overlay monitoringand control compared to method 2.

The wafer selection model, field selection model and the point selectionmodel discussed as above may be also used to form a combined overlaycorrection map from a plurality of lots for real time monitoring. FIG.7A is a flowchart showing a method 700 for forming a combined overlaycorrection map for wafers from a plurality of lots according to variousembodiments of the present disclosure. In some embodiments, the method700 is implemented using the system 100 as shown in FIGS. 1A-1B. It isunderstood that additional steps can be provided before, during, andafter the method 700, and some steps described can be replaced,eliminated, or moved around for additional embodiments of the method700. The method 700 is an example, and is not intended to limit thedisclosure beyond what is explicitly recited in the claims.

Method 700 starts with operation 702 by forming resist patterns on oneor more wafers from a plurality of lots using the exposing tool 106 asshown in FIGS. 1A-1B. At operation 704, a group of patterned wafers areselected from each lot using a wafer selection model that issubstantially similar to the wafer selection model discussed with regardto operation 204 in FIG. 2A. In some embodiments, the wafers selectedfrom one lot may be different from the wafers selected from another lot.

At operation 706, a group of fields may be selected for the wafersselected in each lot for the following overlay measurements. The fieldsmay be selected using a field selection model 730 (as shown in FIG. 7B)that is substantially similar to the field selection model 400 discussedwith regard to operation 206 of FIG. 2A and operation 402 of FIG. 4G.The filed selection model 730 starts with operation 732 by separatingall fields on a wafer into first and second groups of fields, as shownin FIGS. 4E-4F. At operation 734 of the field selection model 730, thefirst group of fields is selected for all the selected wafers in thefirst lot as shown in FIG. 7C. At operation 736, the second group offields is selected for all the selected wafers in the second lot asshown in FIG. 7C. Although only a group of fields is selected for thewafers in one lot, after combining the first and second lots, all fieldshave been measured for the wafers as shown in FIG. 7C.

Method 700 then proceeds to operation 707 by selecting an un-measuredlot, and to operation 708 by selecting an un-measured wafer from thecurrent lot. Method 700 proceeds to operation 710 by selecting one ormore points from each field of the selected group of fields using apoint selection model, to operation 712 by measuring overlay errors ofthe selected point on the current wafer, to operation 714 by forming anoverlay correction map using the overlay errors of the current wafer,and to operation 716 by storing the overlay correction map in a computerreadable media. Operations 710-716 may be substantially similar tooperations 210-216 of method 200 with regard to FIG. 2A.

Method 700 proceeds to operation 718 by deciding if all the wafers inthe current lot have been measured. When not all the wafers in thecurrent lot are measured, method 700 proceeds to operation 708 byselecting the next un-measured wafer from the current lot.

When all the wafers in the current lot have been measured, method 700proceeds to operation 720 by combining the overlay correction maps ofall selected wafers in the current lot to update the combined overlaycorrection map. The combined overlay correction map may include overlayerror information from a plurality of lots. The combined overlaycorrection map may be constantly updated after overlay measurement ofeach lot during the real time overlay monitoring and control.

After overlay measurement of one lot, operation 720 returns back tooperation 707 to select the next un-measured lot to perform overlaymeasurements and form overlay correction maps for the next lot. Theoverlay correction maps of the next lot are then combined to be updatedto the combined overlay correction map. In some embodiments, since theoverlay correction maps generated from different lots may have differentwafer, field, or point selections, and the wafers from different lotsmay be exposed under different conditions, the overlay correction mapsmay exhibit different scales with respect to, for example, errormagnitude and/or error distribution. It may be difficult to directlycombine the overlay correction data in the maps from different lots toform a combined overlay correction data. Therefore, an exponentiallyweighted moving average (EWMA) method may be used to correct and smooththe overlay correction maps from different lots. The overlay correctionmaps from different lots may then be combined to obtain the combinedoverlay correction map, as shown in FIG. 7C.

Operation 724 shows a real time overlay monitor and control using theup-to-date combined overlay correction map. The combined overlaycorrection map may be used to investigate the error distribution of theresist pattern on the wafer, thus corresponding adjustments can be madeto the exposure tool 108 to offer better exposure accuracy in the futurelithography process using the exposure tool 108.

Referring to the combined overlay correction map obtained using method700 of FIG. 7A, in some embodiments, each overlay error may berepresented using an arrow (for example as shown in FIG. 6A), where thelength of the arrow reflects the distance between the positions of theselected point and the corresponding overlay mark. A length mean of thecombined overlay error correction map may be calculated as the geometricmean value of all the overlay errors. Therefore the smaller number thelength mean is, the less overlay error the map shows. The direction ofthe arrow is reflected by the angle between the arrow and a verticaldirection, or between the arrow and a horizontal direction. An anglesimilarity may be calculated using a cosine function of the angle, andan angle similarity mean may be then calculated as the geometric meanvalue of all the overlay errors. Therefore the closer the anglesimilarity mean is to 1, the less overlay error the map shows. Whencomparing an overlay measurement method decided by the user'sexperience, and the combined overlay correction map obtained usingmethod 700 of FIG. 7A, the length mean value of the combined overlaycorrection map is less than the length mean value of the overlaycorrection map decided by the user's experience. The angle similaritymean of the combined overlay correction map is greater than the anglesimilarity mean of the overlay correction map decided by user'sexperience. Therefore, the combined overlay correction map using method700 is more accurate and effective for overlay monitoring and controlcompared to the overlay correction map decided by the user's experience.

Although the fields on a wafer are only described to be separated intotwo groups in the current disclosure, the fields may be divided into anysuitable number of groups in any suitable topology, for example ngroups. The lots to be measured to form the combined overlay correctionmap may also include m lots, where each of the n groups of fields isassigned to the selected wafers of each of the m lots for overlaymeasurement. The number m of the lots may or may not equal to the numbern of the groups of the fields.

When the overlay measurement result is out of a predeterminedspecification on the combined overlay correction map obtained atoperation 220 or operation 722, the patterned wafers may be fed back tothe operation 202 or operation 702 to re-form the resist pattern on theunqualified wafers using an adjusted exposing condition and/or acorrected overlay shift. The method 200 or method 700 may be repeatedfor a plurality of times until the overlay measurement result isqualified for the specification.

When the overlay measurement result of resist pattern is within apredetermined specification at operation 220 or operation 722, thecurrent exposing condition is qualified and the overlay shift is valid.The wafer with the resist pattern may be then sent on to one or moresubsequent processes. The subsequent processes may include an implantprocess to form a well or a source/drain on the wafer. The subsequentprocesses may also include an etching process to transfer the resistpattern into the wafer, further forming various features on the wafer,such as isolation features or interconnection features.

The present disclosure provides a method for forming a combined overlaycorrection map for overlay control and monitoring. The method includesforming resist patterns on one or more wafers in a lot by an exposingtool; selecting a group of patterned wafers in the lot using a waferselection model; selecting a group of fields for each of the selectedgroup of patterned wafers using a field selection model; selecting atleast one point in each of the selected group of fields using a pointselection model; measuring overlay errors of the selected at least onepoint on a selected wafer; forming an overlay correction map using themeasured overlay errors on the selected wafer; and generating a combinedoverlay correction map using the overlay correction map of each selectedwafer in the lot. The method further includes forming a plurality ofpoints in each field. The plurality of points correspond to overlaymarks transferred from a mask to the formed resist patterns. The methodfurther includes comparing positions of each selected point andcorresponding overlay mark. Each overlay error is a vector includingdistance and angle differences between the positions of each selectedpoint and the corresponding overlay mark.

In some embodiments, the wafer selection model includes weighting awafer location in the lot using a weighting factor related to apossibility of wafer disposed in the wafer location being chosen foroverlay measurement in previous measurements; and selecting a patternedwafer in the wafer location with a greatest weight factor. The weightingfactor for the wafer location multiplies a number that is less than 1 asthe wafer disposed in the wafer location gets chosen once for theoverlay measurement. In some embodiments, the weight factor for thewafer location decreases exponentially when the wafer gets chosen once.

In some embodiments, the field selection model includes separatingfields on a wafer into first and second group of fields, the first groupof fields including center, edge and first type of fields, and thesecond group of fields including center, edge and second type of fields;separating the group of selected patterned wafers into first and secondsub-groups of wafers; selecting the first group of fields for the firstsub-group of the selected wafers; and selecting the second group offields for the second sub-group of the selected wafers.

In some embodiments, the point selection model includes weighting pointsin each field using a weighting factor for each point related to apossibility of being chosen for overlay measurement in previousmeasurements; and selecting the at least one point in each field with agreatest weight factor. The weighting factor for the wafer locationmultiplies a number that is less than 1 as the wafer disposed in thewafer location gets chosen once for the overlay measurement.

In some embodiments, any of the wafer, field and point selection modelsis generated by a computer using data from previous measurements. Themethod further includes making compensation to the exposing tool usingthe combined overlay correction map.

In some embodiments, the method for forming a combined overlaycorrection map for overlay control and monitoring further includesforming resist patterns on one or more wafers in first and second lotsby the exposing tool. The field selection model includes separatingfields on a wafer into first and second group of fields, the first groupof fields including center, edge and first type of fields, and thesecond group of fields including center, edge and second type of fields;selecting the first group of fields for the selected group of patternedwafers in the first lot; and selecting the second group of fields forthe selected group of patterned wafers in the second lot. The combinedoverlay correction map is generated using the overlay correction map ofeach selected wafer in the first and second lots.

In yet some other embodiments, a method for forming a combined overlaycorrection map for overlay monitoring and control is disclosed. Themethod includes forming resist patterns on one or more wafers in each offirst and second lots by an exposing tool; selecting a group ofpatterned wafers from each of the first and second lots using a waferselection model; selecting a group of fields for the selected patternedwafers in each of the first and second lots using a field selectionmodel; selecting at least one point in each of the selected group offields using a point selection model; measuring overlay errors of theselected at least one point on a selected wafer; forming an overlaycorrection map using the measured overlay errors on the selected wafer;and generating a combined overlay correction map using the overlaycorrection map of each selected wafer in the first and second lots.

In yet some other embodiments, a system for overlay monitoring andcontrol comprises an exposing tool configured to form resist patterns onone or more wafer in a lot; an overlay metrology tool coupled to theexposing tool; and a computer coupled to the overlay metrology tool. Theoverlay metrology tool is configured to select a group of patternedwafers in the using a wafer selection model, select a group of fieldsfor each of the selected group of patterned wafers using a fieldselection model, select at least one point in each of the selected groupof fields using a point selection model, and measure overlay errors ofthe selected at least one point on a selected wafer. The computer isconfigured to generate any of the wafer, field and point selectionmodels, forming an overlay correction map using the measured overlayerrors on the selected wafer, and generate a combined overlay correctionmap using the overlay correction map of each selected wafer in the lot.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

1. A method for overlay monitoring and control, the method comprising:forming resist patterns on one or more wafers in a lot by an exposingtool; selecting a group of patterned wafers in the lot using a waferselection model; selecting a group of fields for each of the selectedgroup of patterned wafers using a field selection model; selecting atleast one point in each of the selected group of fields using a pointselection model; measuring overlay errors of the selected at least onepoint on a selected wafer; forming, by a computer, an overlay correctionmap using the measured overlay errors on the selected wafer; andgenerating, by the computer, a combined overlay correction map using theoverlay correction map of each selected wafer in the lot.
 2. The methodof claim 1, wherein forming resist patterns includes forming a pluralityof points in each field, the plurality of points corresponding tooverlay marks transferred from a mask to the formed resist patterns. 3.The method of claim 2, wherein measuring the overlay errors includescomparing positions of each selected point and corresponding overlaymark.
 4. The method of claim 3, wherein each overlay error is a vectorincluding distance and angle differences between the positions of eachselected point and the corresponding overlay mark.
 5. The method ofclaim 1, wherein the wafer selection model includes: weighting a waferlocation in the lot using a weighting factor related to a possibility ofwafer disposed in the wafer location being chosen in previous overlaymeasurements; and selecting a patterned wafer in the wafer location withthe greatest weighting factor, wherein the weighting factor for thewafer location multiplies a number that is less than 1 as the waferdisposed in the wafer location gets chosen once in the previous overlaymeasurements.
 6. The method of claim 5, wherein the weighting factor forthe wafer location decreases exponentially when the wafer gets chosenonce.
 7. The method of claim 1, wherein the field selection modelincludes: separating fields on a wafer into first and second group offields, the first group of fields including center, edge and first typeof fields, and the second group of fields including center, edge andsecond type of fields; separating the group of selected patterned wafersinto first and second sub-groups of wafers; selecting the first group offields for the first sub-group of wafers; and selecting the second groupof fields for the second sub-group of wafers.
 8. The method of claim 2,wherein the point selection model includes: selecting the at least onepoint which is different from a previous selected point.
 9. The methodof claim 2, wherein the point selection model includes: weighting pointsin each field using a weighting factor for each point related to apossibility of being chosen for overlay measurement in previous overlaymeasurements; and selecting the at least one point in each field withthe greatest weighting factor, wherein the weighting factor for eachpoint multiplies a number that is less than 1 as the point gets chosenonce in the previous overlay measurements.
 10. The method of claim 1,wherein any of the wafer, field and point selection models is generatedby a computer using data from previous overlay measurements.
 11. Themethod of claim 10, further comprising making overlay shift compensationto the exposing tool using the combined overlay correction map.
 12. Themethod of claim 1, further comprising: forming resist patterns on one ormore wafers in first and second lots by the exposing tool.
 13. Themethod of claim 12, wherein the field selection model includes:separating fields on a wafer into first and second group of fields, thefirst group of fields including center, edge and first type of fields,and the second group of fields including center, edge and second type offields; selecting the first group of fields for the selected group ofpatterned wafers in the first lot; and selecting the second group offields for the selected group of patterned wafers in the second lot. 14.The method of claim 13, wherein the combined overlay correction map isgenerated using the overlay correction map of each selected wafer in thefirst and second lots.
 15. A method for overlay monitoring and control,the method comprising: forming resist patterns on one or more wafers ineach of first and second lots by an exposing tool; selecting a group ofpatterned wafers from each of the first and second lots using a waferselection model; selecting a group of fields for the selected patternedwafers in each of the first and second lots using a field selectionmodel; selecting at least one point in each of the selected group offields using a point selection model; measuring overlay errors of theselected at least one point on a selected wafer; forming, by a computer,an overlay correction map using the measured overlay errors on theselected wafer; and generating, by the computer, a combined overlaycorrection map using the overlay correction map of each selected waferin the first and second lots.
 16. The method of claim 15, wherein thefield selection model includes: separating fields on a wafer into firstand second group of fields, the first group of fields including center,edge and first type of fields, and the second group of fields includingcenter, edge and second type of fields; selecting the first group offields for the selected group of patterned wafers in the first lot; andselecting the second group of fields for the selected group of patternedwafers in the second lot.
 17. A system for overlay monitoring andcontrol, the system comprising: an exposing tool configured to formresist patterns on one or more wafers in a lot; an overlay metrologytool coupled to the exposing tool and configured to: select a group ofpatterned wafers in the lot using a wafer selection model, select agroup of fields for each of the selected group of patterned wafers usinga field selection model, select at least one point in each of theselected group of fields using a point selection model, and measureoverlay errors of the selected at least one point on a selected wafer;and a computer coupled to the overlay metrology tool and configured to:generate any of the wafer, field and point selection models, form anoverlay correction map using the measured overlay errors on the selectedwafer, and generate a combined overlay correction map using the overlaycorrection map of each selected wafer in the lot.
 18. The system ofclaim 17, wherein each field includes a plurality of points thatcorrespond to overlay marks transferred from a mask to the resistpatterns using the exposing tool.
 19. The system of claim 17, whereinthe field selection model includes: separating fields on a wafer intofirst and second group of fields, the first group of fields includingcenter, edge and first type of fields, and the second group of fieldsincluding center, edge and second type of fields; separating the groupof selected patterned wafers into first and second sub-groups of wafers;selecting the first group of fields for the first sub-group of theselected wafers; and selecting the second group of fields for the secondsub-group of the selected wafers.
 20. The system of claim 17, whereinthe point selection model includes: weighting points in each field usinga weighting factor for each point related to a possibility of beingchosen in previous overlay measurements; and selecting the at least onepoint in each field with the greatest weighting factor, wherein theweighting factor for each point multiplies a number that is less than 1as the point gets chosen once in the previous overlay measurements.